BibTeX records: Shou-Chung Lee

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@inproceedings{DBLP:conf/irps/ChenLOL18,
  author       = {Pin{-}Shiang Chen and
                  Shou{-}Chung Lee and
                  A. S. Oates and
                  Chee Wee Liu},
  title        = {{BEOL} {TDDB} reliability modeling and lifetime prediction using critical
                  energy to breakdown},
  booktitle    = {{IEEE} International Reliability Physics Symposium, {IRPS} 2018, Burlingame,
                  CA, USA, March 11-15, 2018},
  pages        = {6},
  publisher    = {{IEEE}},
  year         = {2018},
  url          = {https://doi.org/10.1109/IRPS.2018.8353626},
  doi          = {10.1109/IRPS.2018.8353626},
  timestamp    = {Wed, 16 Oct 2019 14:14:55 +0200},
  biburl       = {https://dblp.org/rec/conf/irps/ChenLOL18.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}
@inproceedings{DBLP:conf/irps/OngLO18,
  author       = {Yi Ching Ong and
                  Shou{-}Chung Lee and
                  A. S. Oates},
  title        = {Percolation defect nucleation and growth as a description of the statistics
                  of electrical breakdown for gate, {MOL} and {BEOL} dielectrics},
  booktitle    = {{IEEE} International Reliability Physics Symposium, {IRPS} 2018, Burlingame,
                  CA, USA, March 11-15, 2018},
  pages        = {7--1},
  publisher    = {{IEEE}},
  year         = {2018},
  url          = {https://doi.org/10.1109/IRPS.2018.8353667},
  doi          = {10.1109/IRPS.2018.8353667},
  timestamp    = {Tue, 22 Jan 2019 00:00:00 +0100},
  biburl       = {https://dblp.org/rec/conf/irps/OngLO18.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}
@inproceedings{DBLP:conf/irps/LeeO15,
  author       = {Shou{-}Chung Lee and
                  A. S. Oates},
  title        = {On the voltage dependence of copper/low-k dielectric breakdown},
  booktitle    = {{IEEE} International Reliability Physics Symposium, {IRPS} 2015, Monterey,
                  CA, USA, April 19-23, 2015},
  pages        = {3},
  publisher    = {{IEEE}},
  year         = {2015},
  url          = {https://doi.org/10.1109/IRPS.2015.7112699},
  doi          = {10.1109/IRPS.2015.7112699},
  timestamp    = {Wed, 16 Oct 2019 14:14:55 +0200},
  biburl       = {https://dblp.org/rec/conf/irps/LeeO15.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}
@article{DBLP:journals/mr/OatesL06,
  author       = {A. S. Oates and
                  Shou{-}Chung Lee},
  title        = {Electromigration failure distributions of dual damascene Cu /low -
                  k interconnects},
  journal      = {Microelectron. Reliab.},
  volume       = {46},
  number       = {9-11},
  pages        = {1581--1586},
  year         = {2006},
  url          = {https://doi.org/10.1016/j.microrel.2006.07.038},
  doi          = {10.1016/J.MICROREL.2006.07.038},
  timestamp    = {Sat, 22 Feb 2020 00:00:00 +0100},
  biburl       = {https://dblp.org/rec/journals/mr/OatesL06.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}
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