BibTeX record journals/mr/FeybesseDRM03

download as .bib file

@article{DBLP:journals/mr/FeybesseDRM03,
  author       = {Adeline Feybesse and
                  Ivana Deram and
                  Jean{-}Michel Reynes and
                  Eric Moreau},
  title        = {Copper metallization influence on power {MOS} reliability},
  journal      = {Microelectron. Reliab.},
  volume       = {43},
  number       = {4},
  pages        = {571--576},
  year         = {2003},
  url          = {https://doi.org/10.1016/S0026-2714(03)00027-1},
  doi          = {10.1016/S0026-2714(03)00027-1},
  timestamp    = {Sat, 22 Feb 2020 19:27:07 +0100},
  biburl       = {https://dblp.org/rec/journals/mr/FeybesseDRM03.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}
a service of  Schloss Dagstuhl - Leibniz Center for Informatics

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.