Andreas Hössinger
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2010 – today
- 2018
- [c5]Paul Manstetten, Lukas Gnam, Andreas Hössinger, Siegfried Selberherr, Josef Weinbub:
Sparse Surface Speed Evaluation on a Dynamic Three-Dimensional Surface Using an Iterative Partitioning Scheme. ICCS (1) 2018: 694-707 - 2017
- [c4]Paul Manstetten, Josef Weinbub, Andreas Hössinger, Siegfried Selberherr:
Using Temporary Explicit Meshes for Direct Flux Calculation on Implicit Surfaces. ICCS 2017: 245-254 - [c3]Georgios Diamantopoulos, Josef Weinbub, Andreas Hössinger, Siegfried Selberherr:
Evaluation of the shared-memory parallel Fast Marching Method for re-distancing problems. ICCSA (7) 2017: 1-8 - 2016
- [c2]Josef Weinbub, Andreas Hössinger:
Comparison of the Parallel Fast Marching Method, the Fast Iterative Method, and the Parallel Semi-Ordered Fast Iterative Method. ICCS 2016: 2271-2275 - [c1]Josef Weinbub, Andreas Hössinger:
Shared-memory parallelization of the fast marching method using an overlapping domain-decomposition approach. SpringSim (HPS) 2016: 18
2000 – 2009
- 2006
- [j5]W. Wessner, Johann Cervenka, Clemens Heitzinger, Andreas Hössinger, Siegfried Selberherr:
Anisotropic Mesh Refinement for the Simulation of Three-Dimensional Semiconductor Manufacturing Processes. IEEE Trans. on CAD of Integrated Circuits and Systems 25(10): 2129-2139 (2006) - 2004
- [j4]Clemens Heitzinger, Andreas Hössinger, Siegfried Selberherr:
An algorithm for smoothing three-dimensional Monte Carlo ion implantation simulation results. Mathematics and Computers in Simulation 66(2-3): 219-230 (2004) - 2003
- [j3]Clemens Heitzinger, Andreas Hössinger, Siegfried Selberherr:
On smoothing three-dimensional Monte Carlo ion implantation simulation results. IEEE Trans. on CAD of Integrated Circuits and Systems 22(7): 879-883 (2003) - [j2]Thomas Binder, Andreas Hössinger, Siegfried Selberherr:
Rigorous integration of semiconductor process and device simulators. IEEE Trans. on CAD of Integrated Circuits and Systems 22(9): 1204-1214 (2003) - 2000
- [j1]Andreas Hössinger, Erasmus Langer, Siegfried Selberherr:
Parallelization of a Monte Carlo ion implantation simulator. IEEE Trans. on CAD of Integrated Circuits and Systems 19(5): 560-567 (2000)
Coauthor Index
last updated on 2018-12-01 22:40 CET by the dblp team
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