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Bei Yu 0001
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Publications
- 2024
- [j90]Binwu Zhu, Su Zheng, Ziyang Yu, Guojin Chen, Yuzhe Ma, Fan Yang, Bei Yu, Martin D. F. Wong:
L2O-ILT: Learning to Optimize Inverse Lithography Techniques. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 43(3): 944-955 (2024) - 2023
- [j78]Ziyang Yu, Guojin Chen, Yuzhe Ma, Bei Yu:
A GPU-Enabled Level-Set Method for Mask Optimization. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 42(2): 594-605 (2023) - [j69]Guojin Chen, Ziyang Yu, Hongduo Liu, Yuzhe Ma, Bei Yu:
DevelSet: Deep Neural Level Set for Instant Mask Optimization. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 42(12): 5020-5033 (2023) - [c161]Guojin Chen, Zehua Pei, Haoyu Yang, Yuzhe Ma, Bei Yu, Martin D. F. Wong:
Physics-Informed Optical Kernel Regression Using Complex-valued Neural Fields. DAC 2023: 1-6 - [c154]Zixiao Wang, Yunheng Shen, Wenqian Zhao, Yang Bai, Guojin Chen, Farzan Farnia, Bei Yu:
DiffPattern: Layout Pattern Generation via Discrete Diffusion. DAC 2023: 1-6 - [c143]Zehua Pei, Fangzhou Liu, Zhuolun He, Guojin Chen, Haisheng Zheng, Keren Zhu, Bei Yu:
AlphaSyn: Logic Synthesis Optimization with Efficient Monte Carlo Tree Search. ICCAD 2023: 1-9 - [i62]Guojin Chen, Zehua Pei, Haoyu Yang, Yuzhe Ma, Bei Yu, Martin D. F. Wong:
Physics-Informed Optical Kernel Regression Using Complex-valued Neural Fields. CoRR abs/2303.08435 (2023) - [i60]Guojin Chen, Ziyang Yu, Hongduo Liu, Yuzhe Ma, Bei Yu:
DevelSet: Deep Neural Level Set for Instant Mask Optimization. CoRR abs/2303.12529 (2023) - [i59]Wenqian Zhao, Xufeng Yao, Ziyang Yu, Guojin Chen, Yuzhe Ma, Bei Yu, Martin D. F. Wong:
AdaOPC: A Self-Adaptive Mask Optimization Framework For Real Design Patterns. CoRR abs/2303.12723 (2023) - [i58]Zixiao Wang, Yunheng Shen, Wenqian Zhao, Yang Bai, Guojin Chen, Farzan Farnia, Bei Yu:
DiffPattern: Layout Pattern Generation via Discrete Diffusion. CoRR abs/2303.13060 (2023) - [i57]Guojin Chen, Haoyu Yang, Bei Yu:
GPU-accelerated Matrix Cover Algorithm for Multiple Patterning Layout Decomposition. CoRR abs/2303.14335 (2023) - 2022
- [j59]Guojin Chen, Wanli Chen, Qi Sun, Yuzhe Ma, Haoyu Yang, Bei Yu:
DAMO: Deep Agile Mask Optimization for Full-Chip Scale. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 41(9): 3118-3131 (2022) - [c119]Wanli Chen, Xinge Zhu, Guojin Chen, Bei Yu:
Efficient Point Cloud Analysis Using Hilbert Curve. ECCV (2) 2022: 730-747 - [c116]Wenqian Zhao, Xufeng Yao, Ziyang Yu, Guojin Chen, Yuzhe Ma, Bei Yu, Martin D. F. Wong:
AdaOPC: A Self-Adaptive Mask Optimization Framework for Real Design Patterns. ICCAD 2022: 123:1-123:9 - [c115]Liangjian Wen, Yi Zhu, Lei Ye, Guojin Chen, Bei Yu, Jianzhuang Liu, Chunjing Xu:
LayouTransformer: Generating Layout Patterns with Transformer via Sequential Pattern Modeling. ICCAD 2022: 124:1-124:9 - 2021
- [c102]Ziyang Yu, Guojin Chen, Yuzhe Ma, Bei Yu:
A GPU-enabled Level Set Method for Mask Optimization. DATE 2021: 1835-1838 - [c98]Guojin Chen, Ziyang Yu, Hongduo Liu, Yuzhe Ma, Bei Yu:
DevelSet: Deep Neural Level Set for Instant Mask Optimization. ICCAD 2021: 1-9 - [c89]Wei Li, Guojin Chen, Haoyu Yang, Ran Chen, Bei Yu:
Learning Point Clouds in EDA. ISPD 2021: 55-62 - 2020
- [c82]Guojin Chen, Wanli Chen, Yuzhe Ma, Haoyu Yang, Bei Yu:
DAMO: Deep Agile Mask Optimization for Full Chip Scale. ICCAD 2020: 19:1-19:9 - [i31]Guojin Chen, Wanli Chen, Yuzhe Ma, Haoyu Yang, Bei Yu:
DAMO: Deep Agile Mask Optimization for Full Chip Scale. CoRR abs/2008.00806 (2020)
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