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Bei Yu 0001
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Publications
- 2019
- [j32]Derong Liu, Bei Yu, Vinicius S. Livramento, Salim Chowdhury, Duo Ding, Huy Vo, Akshay Sharma, David Z. Pan:
Synergistic Topology Generation and Route Synthesis for On-Chip Performance-Critical Signal Groups. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 38(6): 1147-1160 (2019) - 2015
- [j7]Bei Yu, Kun Yuan, Duo Ding, David Z. Pan:
Layout Decomposition for Triple Patterning Lithography. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 34(3): 433-446 (2015) - 2014
- [i13]Bei Yu, Kun Yuan, Boyang Zhang, Duo Ding, David Z. Pan:
Layout decomposition for triple patterning lithography. CoRR abs/1402.2459 (2014) - [i9]Bei Yu, Yen-Hung Lin, Gerard Luk-Pat, Duo Ding, Kevin Lucas, David Z. Pan:
A High-Performance Triple Patterning Layout Decomposer with Balanced Density. CoRR abs/1402.2890 (2014) - [i7]Duo Ding, Bei Yu, David Z. Pan:
GLOW: A global router for low-power thermal-reliable interconnect synthesis using photonic wavelength multiplexing. CoRR abs/1402.2899 (2014) - [i6]Duo Ding, Bei Yu, Joydeep Ghosh, David Z. Pan:
EPIC: Efficient prediction of IC manufacturing hotspots with a unified meta-classification formulation. CoRR abs/1402.2904 (2014) - 2013
- [c16]Jhih-Rong Gao, Bei Yu, Duo Ding, David Z. Pan:
Lithography hotspot detection and mitigation in nanometer VLSI. ASICON 2013: 1-4 - [c13]Bei Yu, Yen-Hung Lin, Gerard Luk-Pat, Duo Ding, Kevin Lucas, David Z. Pan:
A high-performance triple patterning layout decomposer with balanced density. ICCAD 2013: 163-169 - 2012
- [c11]Duo Ding, Bei Yu, Joydeep Ghosh, David Z. Pan:
EPIC: Efficient prediction of IC manufacturing hotspots with a unified meta-classification formulation. ASP-DAC 2012: 263-270 - [c10]Duo Ding, Bei Yu, David Z. Pan:
GLOW: A global router for low-power thermal-reliable interconnect synthesis using photonic wavelength multiplexing. ASP-DAC 2012: 621-626 - [c8]Bei Yu, Jhih-Rong Gao, Duo Ding, Yongchan Ban, Jae-Seok Yang, Kun Yuan, Minsik Cho, David Z. Pan:
Dealing with IC manufacturability in extreme scaling (Embedded tutorial paper). ICCAD 2012: 240-242 - 2011
- [c5]Bei Yu, Kun Yuan, Boyang Zhang, Duo Ding, David Z. Pan:
Layout decomposition for triple patterning lithography. ICCAD 2011: 1-8
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