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Danqun Yu

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Journal Articles

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2016
[j2]
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Xuan Feng, Shurong Dong, Hei Wong, Danqun Yu, Kin Leong Pey, Kalya Shubhakar, W. S. Lau:
Effects of thermal annealing on the charge localization characteristics of HfO₂/Au/HfO₂ stack. Microelectron. Reliab. 61: 78-81 (2016)
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Danqun Yu, W. S. Lau, Hei Wong, Xuan Feng, Shurong Dong, Kin Leong Pey:
The variation of the leakage current characteristics of W/Ta₂O₅/W MIM capacitors with the thickness of the bottom W electrode. Microelectron. Reliab. 61: 95-98 (2016)

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