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Sylvain Barraud
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2020 – today
- 2024
- [c20]Ancelin Salerno, Sylvain Barraud:
Evaluation and implementation of High-Dimensionnal Computing for gesture recognition using sEMG signals. ICCAD 2024: 1-6 - 2023
- [c19]T. Dubreuil, Sylvain Barraud, J.-M. Pedini, Jean-Michel Hartmann, F. Boulard, A. Sarrazin, A. Gharbi, Johannes Sturm, A. Lambert, S. Martin, Niccolo Castellani, A. Anotta, A. Magalhaes-Lucas, Aurelie Souhaite, François Andrieu:
Integration of HfO2-based 3D OxRAM with GAA stacked-nanosheet transistor for high-density embedded memory. ESSDERC 2023: 117-120 - 2022
- [c18]T. Dubreuil, P. Amari, Sylvain Barraud, Joris Lacord, Eduardo Esmanhotto, Valentina Meli, S. Martin, Niccolo Castellani, Bernard Previtali, François Andrieu:
A novel 3D 1T1R RRAM architecture for memory-centric Hyperdimensional Computing. IMW 2022: 1-4 - 2021
- [c17]R. Midahuen, Bernard Previtali, C. Fontelaye, G. Nonglaton, Sylvain Barraud, V. Stambouli:
Wafer-scale fabrication of biologically sensitive Si nanowire FET: from pH sensing to electrical detection of DNA hybridization. ESSCIRC 2021: 175-178 - [c16]R. Midahuen, Bernard Previtali, C. Fontelaye, G. Nonglaton, V. Stambouli, Sylvain Barraud:
Wafer-scale fabrication of biologically sensitive Si nanowire FET: from pH sensing to electrical detection of DNA hybridization. ESSDERC 2021: 175-178 - [c15]Michelly de Souza, Sylvain Barraud, Mikaël Cassé, Maud Vinet, Olivier Faynot, Marcelo Antonio Pavanello:
Experimental Assessment of Variability in Junctionless Nanowire nMOS Transistors. ESSDERC 2021: 223-226 - 2020
- [i1]Mona Ezzadeen, D. Bosch, Bastien Giraud, Sylvain Barraud, Jean-Philippe Noël, Didier Lattard, Joris Lacord, Jean-Michel Portal, François Andrieu:
Ultra-High-density 3D vertical RRAM with stacked JunctionLess nanowires for In-Memory-Computing applications. CoRR abs/2012.00061 (2020)
2010 – 2019
- 2019
- [c14]Renan Trevisoli, Rodrigo Trevisoli Doria, Sylvain Barraud, Marcelo Antonio Pavanello:
Compact Analytical Model for Trap-Related Low Frequency Noise in Junctionless Transistors. ESSDERC 2019: 194-197 - 2018
- [c13]Maud Vinet, Louis Hutin, Benoit Bertrand, Heorhii Bohuslavskyi, Andrea Corna, Anthony Amisse, Alessandro Crippa, Léo Bourdet, Romain Maurand, Sylvain Barraud, Matias Urdampilleta, Christopher Bäuerle, Marc Sanquer, Xavier Jehl, Yann-Michel Niquet, Silvano De Franceschi, Tristan Meunier:
Towards scalable silicon quantum computing. DRC 2018: 1-2 - [c12]Louis Hutin, Benoit Bertrand, Romain Maurand, Alessandro Crippa, Matias Urdampilleta, Y. J. Kim, A. Amisse, H. Bohuslavskyi, L. Bourdet, Sylvain Barraud, Xavier Jehl, Yann-Michel Niquet, Marc Sanquer, C. Bauerle, Tristan Meunier, Silvano De Franceschi, Maud Vinet:
Si MOS technology for spin-based quantum computing. ESSDERC 2018: 12-17 - [c11]Antoine Laurent, Xavier Garros, Sylvain Barraud, J. Pelloux-Prayer, Mikaël Cassé, Fred Gaillard, X. Federspiel, David Roy, E. Vincent, Gérard Ghibaudo:
Performance & reliability of 3D architectures (πfet, Finfet, Ωfet). IRPS 2018: 6 - 2017
- [j3]Bruna Cardoso Paz, Renan Trevisoli Doria, Mikaël Cassé, Sylvain Barraud, Gilles Reimbold, Maud Vinet, Olivier Faynot, Marcelo Antonio Pavanello:
Harmonic distortion analysis of triple gate SOI nanowire MOSFETS down to 100 K. Microelectron. Reliab. 79: 111-118 (2017) - [c10]Renan Trevisoli Doria, Rodrigo Trevisoli Doria, Michelly de Souza, Marcelo Antonio Pavanello, Sylvain Barraud:
A new method for junctionless transistors parameters extraction. ESSDERC 2017: 66-69 - [c9]Louis Hutin, Benoit Bertrand, Romain Maurand, Matias Urdampilleta, Baptiste Jadot, H. Bohuslavskyi, L. Bourdet, Yann-Michel Niquet, Xavier Jehl, Sylvain Barraud, C. Bauerle, Tristan Meunier, Marc Sanquer, Silvano De Franceschi, Maud Vinet:
SOI CMOS technology for quantum information processing. ICICDT 2017: 1-4 - 2016
- [j2]Bruna Cardoso Paz, Mikaël Cassé, Sylvain Barraud, Gilles Reimbold, Olivier Faynot, F. Avila-Herrera, Antonio Cerdeira, Marcelo Antonio Pavanello:
Drain current model for short-channel triple gate junctionless nanowire transistors. Microelectron. Reliab. 63: 1-10 (2016) - [c8]R. Lavieville, Theano A. Karatsori, Christoforos G. Theodorou, Sylvain Barraud, C. A. Dimitriadis, Gérard Ghibaudo:
Statistical characterization of drain current local and global variability in sub 15nm Si/SiGe Trigate pMOSFETs. ESSDERC 2016: 142-145 - [c7]Bruna Cardoso Paz, Marcelo Antonio Pavanello, Mikaël Cassé, Sylvain Barraud, Gilles Reimbold, Maud Vinet, Olivier Faynot:
Analog performance of strained SOI nanowires down to 10K. ESSDERC 2016: 222-225 - 2015
- [c6]J. Pelloux-Prayer, Mikaël Cassé, François Triozon, Sylvain Barraud, Yann-Michel Niquet, J.-L. Rouviere, Olivier Faynot, Gilles Reimbold:
Strain effect on mobility in nanowire MOSFETs down to 10nm width: Geometrical effects and piezoresistive model. ESSDERC 2015: 210-213 - [c5]Mukta Singh Parihar, Fanyu Liu, Carlos Navarro, Sylvain Barraud, Maryline Bawedin, Irina Ionica, Abhinav Kranti, Sorin Cristoloveanu:
Back-gate effects and detailed characterization of junctionless transistor. ESSDERC 2015: 282-285 - 2013
- [c4]Remi Coquand, Sylvain Barraud, Mikaël Cassé, Masahiro Koyama, Virginie Maffini-Alvaro, Marie-Pierre Samson, Lucie Tosti, Xavier Mescot, Gérard Ghibaudo, Stéphane Monfray, Frédéric Boeuf, Olivier Faynot, Barbara De Salvo:
Low-temperature transport characteristics in SOI and sSOI nanowires down to 8nm width: Evidence of IDS and mobility oscillations. ESSDERC 2013: 198-201 - [c3]Masahiro Koyama, Mikaël Cassé, Remi Coquand, Sylvain Barraud, Gérard Ghibaudo, Hiroshi Iwai, Gilles Reimbold:
Influence of device scaling on low-frequency noise in SOI tri-gate N- and p-type Si nanowire MOSFETs. ESSDERC 2013: 300-303 - 2012
- [c2]Masahiro Koyama, Mikaël Cassé, Remi Coquand, Sylvain Barraud, Hiroshi Iwai, Gérard Ghibaudo, Gilles Reimbold:
Study of carrier transport in strained and unstrained SOI tri-gate and omega-gate Si-nanowire MOSFETs. ESSDERC 2012: 73-76 - [c1]Veeresh Deshpande, Sylvain Barraud, Xavier Jehl, Romain Wacquez, Maud Vinet, Remi Coquand, B. Roche, B. Voisin, François Triozon, C. Vizioz, L. Tosti, Bernard Previtali, P. Perreau, T. Poiroux, Marc Sanquer, Olivier Faynot:
Scaling of Trigate nanowire (NW) MOSFETs Down to 5 nm Width: 300 K transition to Single Electron Transistor, challenges and opportunities. ESSDERC 2012: 121-124 - 2011
- [j1]Kiichi Tachi, Sylvain Barraud, Kuniyuki Kakushima, Hiroshi Iwai, Sorin Cristoloveanu, Thomas Ernst:
Comparison of low-temperature electrical characteristics of gate-all-around nanowire FETs, Fin FETs and fully-depleted SOI FETs. Microelectron. Reliab. 51(5): 885-888 (2011)
Coauthor Index
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last updated on 2024-10-07 21:22 CEST by the dblp team
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