BibTeX record journals/mr/WangZMCLLCZS16

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@article{DBLP:journals/mr/WangZMCLLCZS16,
  author       = {X. Y. Wang and
                  H. Zhang and
                  X. P. Ma and
                  Q. Cheng and
                  C. G. Li and
                  M. X. Li and
                  T. N. Chen and
                  P. Zhang and
                  J. Q. Shao},
  title        = {Degradation behavior and mechanism of polymer films for high-ohmic
                  resistor protection in a heat and humid environment},
  journal      = {Microelectron. Reliab.},
  volume       = {57},
  pages        = {79--85},
  year         = {2016},
  url          = {https://doi.org/10.1016/j.microrel.2015.12.005},
  doi          = {10.1016/J.MICROREL.2015.12.005},
  timestamp    = {Sat, 22 Feb 2020 19:28:38 +0100},
  biburl       = {https://dblp.org/rec/journals/mr/WangZMCLLCZS16.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}
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