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"Rigorous extraction of process variations for 65nm CMOS design."

Wei Zhao et al. (2007)

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DOI: 10.1109/ESSCIRC.2007.4430253

access: closed

type: Conference or Workshop Paper

metadata version: 2023-06-23

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  - conf/esscirc/ZhaoCLAANN07
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Wei Zhao, Yu Cao, Frank Liu, Kanak Agarwal, Dhruva Acharyya, Sani R. Nassif, Kevin J. Nowka:
Rigorous extraction of process variations for 65nm CMOS design. ESSCIRC 2007: 89-92

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