"Strain and layout management in dual channel (sSOI substrate, SiGe ..."

François Andrieu et al. (2014)

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DOI: 10.1109/ESSDERC.2014.6948769

access: closed

type: Conference or Workshop Paper

metadata version: 2024-10-29

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  - conf/essderc/AndrieuCBPNRBPPSGMBGGCBRPSRJWAVFH14
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François Andrieu, Mikaël Cassé, E. Baylac, P. Perreau, O. Nier, Denis Rideau, R. Berthelon, Franck Pourchon, A. Pofelski, Barbara De Salvo, C. Gallon, Vincent Mazzocchi, D. Barge, C. Gaumer, O. Gourhant, A. Cros, Vincent Barral, Rossella Ranica, Nicolas Planes, Walter Schwarzenbach, E. Richard, Emmanuel Josse, Olivier Weber, Franck Arnaud, Maud Vinet, Olivier Faynot, Michel Haond:
Strain and layout management in dual channel (sSOI substrate, SiGe channel) planar FDSOI MOSFETs. ESSDERC 2014: 106-109

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