"Towards high performance sub-10nm finW bulk FinFET technology."

Thomas Chiarella et al. (2016)

> Home

Details and statistics

DOI: 10.1109/ESSDERC.2016.7599605

access: closed

type: Conference or Workshop Paper

metadata version: 2023-07-28

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - conf/essderc/ChiarellaKRRHEK16
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/conf/essderc/ChiarellaKRRHEK16
Thomas Chiarella, Stefan Kubicek, E. Rosseel, Romain Ritzenthaler, Andriy Hikavyy, P. Eyben, An De Keersgieter, L.-Å. Ragnarsson, M.-S. Kim, S.-A. Chew, Tom Schram, S. Demuynck, Miroslav Cupák, Luc Rijnders, Morin Dehan, Naoto Horiguchi, Jérôme Mitard, Dan Mocuta, Anda Mocuta, Aaron Voon-Yew Thean:
Towards high performance sub-10nm finW bulk FinFET technology. ESSDERC 2016: 131-134

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.