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"CAD utilities to comprehend layout-dependent stress effects in 45 nm high- ..."

Akif Sultan et al. (2009)

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DOI: 10.1109/ISQED.2009.4810335

access: closed

type: Conference or Workshop Paper

metadata version: 2023-03-23

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  dblp key:
  - conf/isqed/SultanFSvMPHCKCMTCHKAGHWBBIA09
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  persistent URL:
  - https://dblp.org/rec/conf/isqed/SultanFSvMPHCKCMTCHKAGHWBBIA09
Akif Sultan, John Faricelli, Sushant Suryagandh, Hans vanMeer, Kaveri Mathur, James Pattison, Sean Hannon, Greg Constant, Kalyana Kumar, Kevin Carrejo, Joe Meier, Rasit Onur Topaloglu, Darin Chan, Uwe Hahn, Thorsten Knopp, Victor Andrade, Bill Gardiol, Steve Hejl, David Wu, James Buller, Larry Bair, Ali Icel, Yuri Apanovich:
CAD utilities to comprehend layout-dependent stress effects in 45 nm high- performance SOI custom macro design. ISQED 2009: 442-446

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