


default search action
"High aspect ratio etching of nanopores in PECVD SiC through AAO mask."
Songmei Wu et al. (2013)
- Songmei Wu, M.-O. Bammatter, Wei Tang, V. Auzelyte, Haixia Zhang

, Juergen Brugger
:
High aspect ratio etching of nanopores in PECVD SiC through AAO mask. NEMS 2013: 986-989

manage site settings
To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.


Google
Google Scholar
Semantic Scholar
Internet Archive Scholar
CiteSeerX
ORCID













