"Process Development for Very Deep Etching of Silicon Using Two Layer Masks ..."

Deepak K. Sharma et al. (2021)

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DOI: 10.1109/VDAT53777.2021.9600921

access: closed

type: Conference or Workshop Paper

metadata version: 2021-11-19

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Deepak K. Sharma, J. John, G. Supriya, Ashwini Jambhalikar, M. S. Giridhar:
Process Development for Very Deep Etching of Silicon Using Two Layer Masks for Fabrication of Mechanically Decoupled MEMS Gyroscope. VDAT 2021: 1-4

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