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"Stress induced leakage current at low field in ultra thin oxides."

François Lime, Gérard Ghibaudo, G. Guégan (2001)

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DOI: 10.1016/S0026-2714(01)00169-X

access: closed

type: Journal Article

metadata version: 2020-02-22

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  - journals/mr/LimeGG01
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  - https://dblp.org/rec/journals/mr/LimeGG01
François Lime, Gérard Ghibaudo, G. Guégan:
Stress induced leakage current at low field in ultra thin oxides. Microelectron. Reliab. 41(9-10): 1421-1425 (2001)

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