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"Flexible metal-insulator-metal capacitor using plasma enhanced binary ..."

Jagan Singh Meena et al. (2010)

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DOI: 10.1016/J.MICROREL.2010.01.046

access: closed

type: Journal Article

metadata version: 2020-02-22

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  - https://dblp.org/rec/journals/mr/MeenaCTYWK10
Jagan Singh Meena, Min-Ching Chu, Jitendra N. Tiwari, Hsin-Chiang You, Chung-Hsin Wu, Fu-Hsiang Ko:
Flexible metal-insulator-metal capacitor using plasma enhanced binary hafnium-zirconium-oxide as gate dielectric layer. Microelectron. Reliab. 50(5): 652-656 (2010)

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