"A Real-Time Operator-Centric Patch Extraction and Analysis Platform for ..."

Giseop Noh (2025)

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DOI: 10.1109/ACCESS.2025.3638806

access: open

type: Journal Article

metadata version: 2025-12-10

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Giseop Noh:
A Real-Time Operator-Centric Patch Extraction and Analysis Platform for Industrial Semiconductor Wafer C&C Processes. IEEE Access 13: 202340-202353 (2025)

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