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"High-density plasma chemical vapor deposition of silicon-based dielectric ..."

Son Van Nguyen (1999)

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DOI: 10.1147/RD.431.0109

access: closed

type: Journal Article

metadata version: 2020-03-13

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Son Van Nguyen:
High-density plasma chemical vapor deposition of silicon-based dielectric films for integrated circuits. IBM J. Res. Dev. 43(1): 109-126 (1999)

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