"Modeling the Effect of Global Layout Pattern on Wire Width Variation for ..."

Daisuke Fukuda et al. (2015)

> Home

Details and statistics

DOI: 10.1587/TRANSFUN.E98.A.1467

access: closed

type: Journal Article

metadata version: 2022-01-03

- view
  authority control:
- export record
  dblp key:
  - journals/ieicet/FukudaWKH15
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/ieicet/FukudaWKH15
Daisuke Fukuda, Kenichi Watanabe, Yuji Kanazawa, Masanori Hashimoto:
Modeling the Effect of Global Layout Pattern on Wire Width Variation for On-the-Fly Etching Process Modification. IEICE Trans. Fundam. Electron. Commun. Comput. Sci. 98-A(7): 1467-1474 (2015)

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.