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"Evaluation of 1/f Noise Characteristics in High-k/Metal Gate and ..."

Takuya Imamoto, Takeshi Sasaki, Tetsuo Endoh (2011)

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DOI: 10.1587/TRANSELE.E94.C.724

access: closed

type: Journal Article

metadata version: 2020-04-11

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  - https://dblp.org/rec/journals/ieicet/ImamotoSE11
Takuya Imamoto, Takeshi Sasaki, Tetsuo Endoh:
Evaluation of 1/f Noise Characteristics in High-k/Metal Gate and SiON/Poly-Si Gate MOSFET with 65 nm CMOS Process. IEICE Trans. Electron. 94-C(5): 724-729 (2011)

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