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"Room-Temperature Atomic Layer Deposition of SnO2 Using ..."

Kentaro Tokoro et al. (2018)

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DOI: 10.1587/TRANSELE.E101.C.317

access: closed

type: Journal Article

metadata version: 2020-04-11

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  - journals/ieicet/TokoroSKMAKH18
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  persistent URL:
  - https://dblp.org/rec/journals/ieicet/TokoroSKMAKH18
Kentaro Tokoro, Shunsuke Saito, Kensaku Kanomata, Masanori Miura, Bashir Ahmmad, Shigeru Kubota, Fumihiko Hirose:
Room-Temperature Atomic Layer Deposition of SnO₂ Using Tetramethyltin and Its Application to TFT Fabrication. IEICE Trans. Electron. 101-C(5): 317-322 (2018)

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