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"SiO2 single layer for reduction of the standing wave effects in ..."
Edson J. Carvalho et al. (2006)
- Edson J. Carvalho, Marco Antonio Robert Alves, Edmundo S. Braga, Lucila Cescato:
SiO2 single layer for reduction of the standing wave effects in the interference lithography of deep photoresist structures on Si. Microelectron. J. 37(11): 1265-1270 (2006)
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