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"Variation-resilient quantifiable plasma process induced damage monitoring."

D. Beckmeier, Andreas Martin (2018)

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DOI: 10.1016/J.MICROREL.2018.06.118

access: closed

type: Journal Article

metadata version: 2021-02-11

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D. Beckmeier, Andreas Martin:
Variation-resilient quantifiable plasma process induced damage monitoring. Microelectron. Reliab. 88-90: 152-158 (2018)

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