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"Gate oxide failures due to anomalous stress from HBM ESD testers."

Charvaka Duvvury et al. (2006)

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DOI: 10.1016/J.MICROREL.2005.07.120

access: closed

type: Journal Article

metadata version: 2023-09-30

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  - https://dblp.org/rec/journals/mr/DuvvurySBRKMC06
Charvaka Duvvury, Robert Steinhoff, Gianluca Boselli, Vijay Reddy, Hans Kunz, Steve Marum, Roger Cline:
Gate oxide failures due to anomalous stress from HBM ESD testers. Microelectron. Reliab. 46(5-6): 656-665 (2006)

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