"Post deposition UV-induced O2 annealing of HfO2 thin ..."

Q. Fang et al. (2005)

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DOI: 10.1016/J.MICROREL.2004.11.017

access: closed

type: Journal Article

metadata version: 2021-08-27

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Q. Fang, I. Liaw, Mircea Modreanu, Paul K. Hurley, I. W. Boyd:
Post deposition UV-induced O₂ annealing of HfO₂ thin films. Microelectron. Reliab. 45(5-6): 957-960 (2005)

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