"Evaluation of the nanoindentation behaviors of SiGe epitaxial layer on Si ..."

Bo-Ching He et al. (2010)

> Home

Details and statistics

DOI: 10.1016/J.MICROREL.2009.08.005

access: closed

type: Journal Article

metadata version: 2020-02-22

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/mr/HeCWLYLWC10
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/mr/HeCWLYLWC10
Bo-Ching He, Chun-Hu Cheng, Hua-Chiang Wen, Yi-Shao Lai, Ping-Feng Yang, Meng-Hung Lin, Wen-Fa Wu, Chang-Pin Chou:
Evaluation of the nanoindentation behaviors of SiGe epitaxial layer on Si substrate. Microelectron. Reliab. 50(1): 63-69 (2010)

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.