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"Comparison of deposition models for a TEOS LPCVD process."

Stefan Holzer et al. (2007)

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DOI: 10.1016/J.MICROREL.2007.01.058

access: closed

type: Journal Article

metadata version: 2020-02-22

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Stefan Holzer, Alireza Sheikholeslami, Markus Karner, Tibor Grasser, Siegfried Selberherr:
Comparison of deposition models for a TEOS LPCVD process. Microelectron. Reliab. 47(4-5): 623-625 (2007)

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