Stop the war!

Остановите войну!

for scientists:

default search action

combined dblp search
author search
venue search
publication search

ask others

"The role of a tensile stress bias for a sensitive silicon mechanical ..."

W. S. Lau et al. (2012)

> Home

Details and statistics

DOI: 10.1016/J.MICROREL.2012.06.111

access: closed

type: Journal Article

metadata version: 2020-02-22

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/mr/LauYSC12
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/mr/LauYSC12
W. S. Lau, Peizhen Yang, S. Y. Siah, L. Chan:
The role of a tensile stress bias for a sensitive silicon mechanical stress sensor based on a change in gate-induced-drain leakage current. Microelectron. Reliab. 52(11): 2847-2850 (2012)

a service of

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.