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"A case study of defects due to process marginalities in deep sub-micron ..."

Hung-Sung Lin et al. (2007)

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DOI: 10.1016/J.MICROREL.2007.07.075

access: closed

type: Journal Article

metadata version: 2020-02-22

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Hung-Sung Lin, Chun-Ming Chen, Kuo-Hsiung Chen, Afung Wang, C. H. Chao:
A case study of defects due to process marginalities in deep sub-micron technology. Microelectron. Reliab. 47(9-11): 1604-1608 (2007)

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