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"The effect of a post processing thermal anneal on pre-existing and stress ..."

Robert O'Connor, Greg Hughes (2011)

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DOI: 10.1016/J.MICROREL.2010.09.019

access: closed

type: Journal Article

metadata version: 2020-02-22

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Robert O'Connor, Greg Hughes:
The effect of a post processing thermal anneal on pre-existing and stress induced electrically active defects in ultra-thin SiON dielectric layers. Microelectron. Reliab. 51(3): 524-528 (2011)

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