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"Efficient damage sensitivity analysis of advanced Cu/low-k bond pad ..."

Olaf van der Sluis et al. (2007)

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DOI: 10.1016/J.MICROREL.2007.04.004

access: closed

type: Journal Article

metadata version: 2023-09-30

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Olaf van der Sluis, R. A. B. Engelen, Richard B. R. van Silfhout, W. D. van Driel, Marcel A. J. van Gils:
Efficient damage sensitivity analysis of advanced Cu/low-k bond pad structures by means of the area release energy criterion. Microelectron. Reliab. 47(12): 1975-1982 (2007)

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