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"Characterisation of the Al2O3 films deposited by ..."

Maciej Wolborski et al. (2006)

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DOI: 10.1016/J.MICROREL.2005.08.002

access: closed

type: Journal Article

metadata version: 2020-02-22

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  - https://dblp.org/rec/journals/mr/WolborskiBOPSRLH06
Maciej Wolborski, Mietek Bakowski, Armando Ortiz, Viljami Pore, Adolf Schöner, Mikko Ritala, Markku Leskelä, Anders Hallén:
Characterisation of the Al₂O₃ films deposited by ultrasonic spray pyrolysis and atomic layer deposition methods for passivation of 4H-SiC devices. Microelectron. Reliab. 46(5-6): 743-755 (2006)

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