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"Contour: A Process Variation Aware Wear-Leveling Mechanism for Inodes of ..."

Xianzhang Chen et al. (2021)

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DOI: 10.1109/TC.2020.3002537

access: closed

type: Journal Article

metadata version: 2021-06-15

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Xianzhang Chen, Edwin H.-M. Sha, Xinxin Wang, Chaoshu Yang, Weiwen Jiang, Qingfeng Zhuge:
Contour: A Process Variation Aware Wear-Leveling Mechanism for Inodes of Persistent Memory File Systems. IEEE Trans. Computers 70(7): 1034-1045 (2021)

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