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"Simulation of arsenic in situ doping with polysilicon CVD and its ..."
Clemens Heitzinger et al. (2003)
- Clemens Heitzinger, Wolfgang Pyka, Naoki Tamaoki, Toshiro Takase, Toshimitsu Ohmine, Siegfried Selberherr:
Simulation of arsenic in situ doping with polysilicon CVD and its application to high aspect ratio trenches. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 22(3): 285-292 (2003)
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