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"Informational Lithography Approach Based on Source and Mask Optimization."
Xu Ma et al. (2021)
- Xu Ma
, Yihua Pan
, Shengen Zhang
, Javier Garcia-Frías
, Gonzalo R. Arce
:
Informational Lithography Approach Based on Source and Mask Optimization. IEEE Trans. Computational Imaging 7: 32-42 (2021)
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