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"Effect of CVD-SiO2 film on reliability of GaAs MESFET with ..."

Yoshihiro Saito, Tatsuya Hashinaga, Shigeru Nakajima (2005)

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DOI: 10.1109/TR.2004.837318

access: closed

type: Journal Article

metadata version: 2020-07-09

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Yoshihiro Saito, Tatsuya Hashinaga, Shigeru Nakajima:
Effect of CVD-SiO₂ film on reliability of GaAs MESFET with Ti/Pt/Au gate metal. IEEE Trans. Reliab. 54(1): 79-82 (2005)

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