"Workload Balancing for Photolithography Machines in Semiconductor ..."

LiangChao Chen et al. (2025)

> Home

Details and statistics

DOI: 10.1109/TSMC.2025.3572370

access: closed

type: Journal Article

metadata version: 2025-11-07

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/tsmc/ChenQWGSZ25
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/tsmc/ChenQWGSZ25
LiangChao Chen, Yan Qiao, NaiQi Wu, Mohammadhossein Ghahramani, Yonghua Shao, Sijun Zhan:
Workload Balancing for Photolithography Machines in Semiconductor Manufacturing via Estimation of Distribution Algorithm Integrating Kmeans Clustering. IEEE Trans. Syst. Man Cybern. Syst. 55(8): 5565-5580 (2025)

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.