"A Compound Semiconductor Process Simulator and its Application to Mask ..."

Masami Kumagai, Kiyoyuki Yokoyama, Satoshi Tazawa (1998)

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DOI: 10.1155/1998/65787

access: open

type: Journal Article

metadata version: 2023-05-08

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Masami Kumagai, Kiyoyuki Yokoyama, Satoshi Tazawa:
A Compound Semiconductor Process Simulator and its Application to Mask Dependent Undercut Etching. VLSI Design 6(1-4): 393-397 (1998)

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