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export results for "Characteristics of silicon nitride after O2 plasma surface treatment for pH-ISFET applications."

 download as .bib file

@article{DBLP:journals/tbe/YinCCSH01,
  author       = {Li{-}Te Yin and
                  Jung{-}Chuan Chou and
                  Wen{-}Yaw Chung and
                  Tai{-}Ping Sun and
                  Shen{-}Ken Hsiung},
  title        = {Characteristics of silicon nitride after O\({}_{\mbox{2}}\) plasma
                  surface treatment for pH-ISFET applications},
  journal      = {{IEEE} Trans. Biomed. Eng.},
  volume       = {48},
  number       = {3},
  pages        = {340--344},
  year         = {2001},
  url          = {https://doi.org/10.1109/10.914797},
  doi          = {10.1109/10.914797},
  timestamp    = {Wed, 28 Jul 2021 01:00:00 +0200},
  biburl       = {https://dblp.org/rec/journals/tbe/YinCCSH01.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}
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