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W. Boullart

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2010 – 2019

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2015
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  - conf/vlsic/HayakawaHYBVVWC15
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Yukio Hayakawa, Atsushi Himeno, Ryutaro Yasuhara, W. Boullart, E. Vecchio, T. Vandeweyer, T. Witters, D. Crotti, M. Jurczak, S. Fujii, S. Ito, Y. Kawashima, Yuuichirou Ikeda, Akifumi Kawahara, Ken Kawai, Zhiqiang Wei, Shunsaku Muraoka, Kazuhiko Shimakawa, Takumi Mikawa, Shinichi Yoneda:
Highly reliable TaOx ReRAM with centralized filament for 28-nm embedded application. VLSIC 2015: 14-

2000 – 2009

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2005
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S. Beckx, M. Demand, S. Locorotondo, K. Henson, M. Claes, V. Paraschiv, D. Shamiryan, P. Jaenen, W. Boullart, S. Degendt:
Implementation of high-k and metal gate materials for the 45nm node and beyond: gate patterning development. Microelectron. Reliab. 45(5-6): 1007-1011 (2005)

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