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Wen-How Lan

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2020 – today

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2020
[c2]
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  dblp key:
  - conf/ickii/ZhangCCCCBLW20
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  - https://dblp.org/rec/conf/ickii/ZhangCCCCBLW20
De-Cheng Zhang, Ching-Chuan Chou, Ho-Hsiang Chen, Shang-Ze Chen, Jian-Ming Chen, Hui-Yun Bor, Wen-How Lan, Mu-Chun Wang:
Fringe Gate Leakage of 28nm HK/MG nMOSFETs with Nitridation Treatments. ICKII 2020: 1-3
[c1]
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Si-Ping Li, Jia-Wei Xu, Wei-Hao Li, Jian-Ming Chen, Chao-Nan Wei, Wen-How Lan, Mu-Chun Wang:
Patterns of Exposing Integrity of 28nm-node High-k Gate Dielectric on p-substrate with Nitridation Treatments. ICKII 2020: 67-70

2010 – 2019

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2018
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  - journals/mr/TuanCWLWFL18
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Fu-Yuan Tuan, Chii-Wen Chen, Mu-Chun Wang, Wen-Shiang Liao, Shea-Jue Wang, Shou-Kong Fan, Wen-How Lan:
Thermal stress probing the channel-length modulation effect of nano n-type FinFETs. Microelectron. Reliab. 83: 260-270 (2018)
2015
[j1]
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  - journals/mr/WangWCLYHL15
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Shea-Jue Wang, Mu-Chun Wang, Shuang-Yuan Chen, Wen-How Lan, Bor-Wen Yang, L. S. Huang, Chuan-Hsi Liu:
Heat stress exposing performance of deep-nano HK/MG nMOSFETs using DPN or PDA treatment. Microelectron. Reliab. 55(11): 2203-2207 (2015)

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