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Alban Zaka
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2020 – today
- 2022
- [c8]Luca Pirro, P. Liebscher, C. Brantz, M. Kessler, H. Herzog, Olaf Zimmerhackl, R. Jain, E. Ebrand, K. Gebauer, Michael Otto, Alban Zaka, Jan Hoentschel:
Impact of Electrical Defects located at Transistor Periphery on Analog and RTN Device Performance. IRPS 2022: 59-1 - 2021
- [c7]Luca Pirro, Aarthi Jayakumar, Olaf Zimmerhackl, Dieter Lipp, Ralf Illgen, Armin Muehlhoff, Ronny Pfuetzner, Alban Zaka, Michael Otto, Jan Hoentschel, Yannick Raffel, Konrad Seidel, Ricardo Olivo:
Comparison of Analog and Noise Performance between Buried Channel versus Surface Devices in HKMG I/O Devices. IRPS 2021: 1-4 - 2020
- [c6]Kyong Jin Hwang, Sagar Premnath Karalkar, Vishal Ganesan, Sevashanmugam Marimuthu, Alban Zaka, Tom Herrmann, Bhoopendra Singh, Robert Gauthier:
Design Optimization of MV-NMOS for ESD Self-protection in 28nm CMOS technology. IRPS 2020: 1-4
2010 – 2019
- 2019
- [c5]Zhixing Zhao, Patrick James Artz, Klaus Hempel, Juergen Faul, Tianbing Chen, Richard Taylor, Jerome Mazurier, Carsten Grass, Jan Hoentschel, David Harame, Steffen Lehmann, Luca Lucci, Yogadissen Andee, Alexis Divay, Luca Pirro, Tom Herrmann, Alban Zaka, Ricardo Sousa
:
22FDX® fMAX Optimization through Parasitics Reduction and GM Boost. ESSDERC 2019: 166-169 - [c4]Luca Pirro, Alban Zaka, Olaf Zimmerhackl, T. Hermann, Michael Otto, E. M. Bazizi, Jan Hoentschel, X. Li, R. Taylor:
Low-Frequency Noise Reduction in 22FDX®: Impact of Device Geometry and Back Bias. IRPS 2019: 1-5 - 2018
- [c3]Mingcheng Chang, Nigel Chan, Vivek Joshi, Sandra Hecker, Udo Ziller, Petra Poth, Alban Zaka, Tom Herrmann, Seunghwan Seo, Hongsik Yoon, Xin Zou, Zhen Xu, Hema Ramamurthy, Torsten Klick, Gabriele Congedo, Youmean Lee, Elke Erben, Gerd Zschaetzsch, Juergen Faul, Jon Kluth, Joerg Schmid, Ralf Van Bentum, Chad Weintraub:
Novel Back Gate Doping Ultra Low Retention Power 22nm FDSOl SRAM for IOT Application. ESSDERC 2018: 78-81 - [c2]Luca Pirro, Olaf Zimmerhackl, Alban Zaka, Lars Müller-Meskamp, Ranjith Nelluri, Tom Hermann, Ignasi Cortes-Mayol, Andreas Huschka, Michael Otto, E. Nowak, Anurag Mittal, Jan Hoentschel:
RTN and LFN Noise Performance in Advanced FDSOI Technology. ESSDERC 2018: 254-257 - 2014
- [c1]E. M. Bazizi, Alban Zaka, Tom Herrmann, Francis Benistant, J. H. M. Tin, J. P. Goh, L. Jiang, M. Joshi, H. van Meer, K. Korablev:
Advanced TCAD for predictive FinFETs Vth mismatch using full 3D process/device simulation. ESSDERC 2014: 341-344 - 2012
- [j1]Yoann Mamy Randriamihaja, Vincent Huard, Xavier Federspiel, Alban Zaka, Pierpaolo Palestri, Denis Rideau, David Roy, Alain Bravaix
:
Microscopic scale characterization and modeling of transistor degradation under HC stress. Microelectron. Reliab. 52(11): 2513-2520 (2012)
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