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Philippe Matagne
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2020 – today
- 2022
- [c4]Gautam Gaddemane, Krishna K. Bhuwalka, Philippe Matagne, Gerhard Rzepa, Maarten L. Van De Put, Sybren Santermans, Oskar Baumgartner, Hao Wu, Geert Hellings:
Co-integration Process Compatible Input/Output (I/O) Device Options for GAA Nanosheet Technology. ESSDERC 2022: 265-268 - 2021
- [c3]Amita Rawat, Krishna K. Bhuwalka, Philippe Matagne, Bjorn Vermeersch, Hao Wu, Geert Hellings, Julien Ryckaert, Changze Liu:
Performance Trade-Off Scenarios for GAA Nanosheet FETs Considering Inner-spacers and Epi-induced Stress: Understanding & Mitigating Process Risks. ESSCIRC 2021: 55-58 - [c2]Amita Rawat, Krishna K. Bhuwalka, Philippe Matagne, Bjorn Vermeersch, Hao Wu, Geert Hellings, Julien Ryckaert, Changze Liu:
Performance Trade-Off Scenarios for GAA Nanosheet FETs Considering Inner-spacers and Epi-induced Stress: Understanding & Mitigating Process Risks. ESSDERC 2021: 55-58 - 2020
- [j2]Nguyen Hoai Ngo, Anh Quang Nguyen, Fabian M. Bufler, Yoshinari Kamakura, Hideki Mutoh, Takayoshi Shimura, Takuji Hosoi, Heiji Watanabe, Philippe Matagne, Kazuhiro Shimonomura, Kohsei Takehara, Edoardo Charbon, Takeharu Goji Etoh:
Toward the Super Temporal Resolution Image Sensor with a Germanium Photodiode for Visible Light. Sensors 20(23): 6895 (2020)
2010 – 2019
- 2019
- [c1]Trong Huynh Bao, Anabela Veloso, Sushil Sakhare, Philippe Matagne, Julien Ryckaert, Manu Perumkunnil, Davide Crotti, Farrukh Yasin, Alessio Spessot, Arnaud Furnémont, Gouri Sankar Kar, Anda Mocuta:
Process, Circuit and System Co-optimization of Wafer Level Co-Integrated FinFET with Vertical Nanosheet Selector for STT-MRAM Applications. DAC 2019: 13
2000 – 2009
- 2003
- [j1]Jean-Pierre Leburton, Satyadev Nagaraja, Philippe Matagne, Richard M. Martin:
Spintronics and exchange engineering in coupled quantum dots. Microelectron. J. 34(5-8): 485-489 (2003)
Coauthor Index
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