"Continual Diffusion with STAMINA: STack-And-Mask INcremental Adapters."

James Seale Smith et al. (2022)

> Home

Details and statistics

DOI: 10.1109/CVPRW63382.2024.00181

access: closed

type: Conference or Workshop Paper

metadata version: 2024-10-08

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - conf/cvpr/SmithHKSJ22
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/conf/cvpr/SmithHKSJ22
James Seale Smith, Yen-Chang Hsu, Zsolt Kira, Yilin Shen, Hongxia Jin:
Continual Diffusion with STAMINA: STack-And-Mask INcremental Adapters. CVPR Workshops 2022: 1744-1754

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.