Stop the war!

Остановите войну!

for scientists:

default search action

combined dblp search
author search
venue search
publication search

ask others

"Invited - Cross-layer modeling and optimization for electromigration ..."

Taeyoung Kim et al. (2016)

> Home

Details and statistics

DOI: 10.1145/2897937.2905010

access: closed

type: Conference or Workshop Paper

metadata version: 2021-02-19

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - conf/dac/KimSCZLWT16
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/conf/dac/KimSCZLWT16
Taeyoung Kim, Zeyu Sun, Chase Cook, Hengyang Zhao, Ruiwen Li, Daniel Wong, Sheldon X.-D. Tan:
Invited - Cross-layer modeling and optimization for electromigration induced reliability. DAC 2016: 30:1-30:6

a service of

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.