"Double patterning lithography friendly detailed routing with redundant via ..."

Kun Yuan, Katrina Lu, David Z. Pan (2009)

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DOI: 10.1145/1629911.1629930

access: closed

type: Conference or Workshop Paper

metadata version: 2025-05-31

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Kun Yuan, Katrina Lu, David Z. Pan:
Double patterning lithography friendly detailed routing with redundant via consideration. DAC 2009: 63-66

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