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"Epitaxial Gd2O3on Si (111) Substrate by Sputtering to Enable Low Cost SOI."
K. R. Khiangte Amlta et al. (2018)
- K. R. Khiangte Amlta, A. Laha, S. Mahapatra, U. Gangway:
Epitaxial Gd2O3on Si (111) Substrate by Sputtering to Enable Low Cost SOI. DRC 2018: 1-2
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