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"High-k/metal gate innovations enabling continued CMOS scaling."

Martin M. Frank (2011)

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DOI: 10.1109/ESSCIRC.2011.6044913

access: closed

type: Conference or Workshop Paper

metadata version: 2017-06-15

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Martin M. Frank:
High-k/metal gate innovations enabling continued CMOS scaling. ESSCIRC 2011: 50-58

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