"Internal photoemission technique for high-k oxide/semiconductor band ..."

Olof Engström et al. (2014)

> Home

Details and statistics

DOI: 10.1109/ESSDERC.2014.6948837

access: closed

type: Conference or Workshop Paper

metadata version: 2017-06-15

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - conf/essderc/EngstromPMH14
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/conf/essderc/EngstromPMH14
Olof Engström, Henryk M. Przewlocki, Ivona Z. Mitrovic, Stephen Hall:
Internal photoemission technique for high-k oxide/semiconductor band offset determination: The influence of semiconductor bulk properties. ESSDERC 2014: 369-372

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.