"Influence of Y2O3 Doped HfO2 High-k Films on Electrical Properties of MOS ..."

Chih-Feng Yen et al. (2022)

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DOI: 10.1109/ICKII55100.2022.9983564

access: closed

type: Conference or Workshop Paper

metadata version: 2023-01-04

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Chih-Feng Yen, Yu-Ya Huang, Shen-Hao Tsao, Shih-Hao Lin, Chun-Hu Cheng:
Influence of Y2O3 Doped HfO2 High-k Films on Electrical Properties of MOS and MIM Devices. ICKII 2022: 225-229

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